Complete Set of CAMPUS® Data, ASTM Data, Biopolymer Database, Application Database, Tradename Database, Literature Database, Toolbox.

Material datasheets available free. Online registration at: www.materialdatacenter.com

Material Data Center is a leading international information system for the plastics industry. Material Data Center offers a comprehensive plastics database, calculation tools, CAE interfaces, a literature database and an application database. For more information about Material Data Center visit www.materialdatacenter.com.

This is the free Material Data Center Datasheet of Luran® S KR2866C - (ASA+PC) - INEOS Styrolution

Material Data Center offers the following functions for Luran® S KR2866C:
unit conversion, PDF datasheet print, comparison with other plastics, application examples, snap fit calculation, beam deflection calculation, CAE Interfaces

Check here, which other Luran datasheets, application examples or technical articles are available in Material Data Center

Use the following short links to get directly to the properties of interest in this datasheet:
Any use of this information falls under the rules of our disclaimer.
제품 설명서
Heat-resistant injection-moulding grade with medium toughness for automotive interior and exterior parts as well as housings for electronic goods. Available in Europe only.
Processing/Physical Characteristics단위시험규격
ISO 데이터
용융 부피 - 흐름 속도, MVR 11 cm³/10min ISO 1133
온도 260 °C -
하중 5 kg -
성형 수축률, 평행 0.5 % ISO 294-4, 2577
성형 수축률, 수직 0.9 % ISO 294-4, 2577
기계적 특성단위시험규격
ISO 데이터
인장탄성률 2600 MPa ISO 527
항복강도 60 MPa ISO 527
항복변형률 3.4 % ISO 527
파단시 평균신율 15 % ISO 527
챠피 충격 강도 , +23°C N kJ/m² ISO 179/1eU
챠피 충격 강도, -30°C 160 kJ/m² ISO 179/1eU
챠피 노치드 충격 강도, +23°C 35 kJ/m² ISO 179/1eA
챠피 노치드 충격 강도, -30°C 5 kJ/m² ISO 179/1eA
열적 특성단위시험규격
ISO 데이터
하중하에서의 변형온도, 1.80 MPa 102 °C ISO 75-1/-2
하중하에서의 변형온도, 0.45 MPa 113 °C ISO 75-1/-2
비카트 연화 온도, B 110 °C ISO 306
선형 열팽창 계수, 평행 90 E-6/K ISO 11359-1/-2
1.5mm 평균두께에서의 난연성 HB class IEC 60695-11-10
테스트 두께 1.6 mm -
전기적 특성단위시험규격
ISO 데이터
부피 저항 1E12 Ohm*m IEC 62631-3-1
표면 저항 1E13 Ohm IEC 62631-3-2
전기 압력 38 kV/mm IEC 60243-1
기타 특성단위시험규격
물에서의 흡수성 0.9 % ISO 62와 유사
조건에서의 흡습성 0.25 % ISO 62와 유사
밀도 1110 kg/m³ ISO 1183
테스트 견본 생산단위시험규격
ISO 데이터
사출성형: 용융수지온도 280 °C ISO 294
사출성형: 금형온도 80 °C ISO 294
사출성형: 사출속도 200 mm/s ISO 294
Processing Recommendation Injection Molding단위시험규격
Pre-drying - Temperature 100 °C -
Pre-drying - Time 2 - 4 h -
용융수지온도 260 - 300 °C -
성형온도 40 - 80 °C -
도표
응력-신율 , Luran® S KR2866C, (ASA+PC), INEOS Styrolution
시컨트탄성율-신율 , Luran® S KR2866C, (ASA+PC), INEOS Styrolution
인장탄성율-온도 , Luran® S KR2866C, (ASA+PC), INEOS Styrolution
특징
생산 공정
사출 성형
인도 유형
펠렛 (입자,알갱이)
부가물
이형제
특별 특성
가시광선 안정성, U.V. 안정성 또는 기후 안정성, 열안정성
지역별 검색
기타 정보
사E성
PREPROCESSING
Pre/Post-processing, Pre-drying, Temperature: 100 °C
Pre/Post-processing, Pre-drying, Time: 2 - 4 h

PROCESSING
injection molding, Melt temperature, range: 260 - 300 °C
injection molding, Mold temperature, range: 40 - 80 °C
Disclaimer
Copyright Altair Engineering GmbH. Altair Engineering GmbH assumes no liability for the system to be free of errors. The user takes sole responsibility for the use of this data under the exclusion of every liability from Altair Engineering GmbH; this is especially valid for claims of compensation resulting from consequential damages. Altair explicitly points out that any decision about the application of materials must be double checked with the producer of this material. This includes all contents of this system. Copyright laws are applicable for the content of this system.
Created: Source: www.materialdatacenter.com


Material Data Center is provided by M-Base Engineering + Software GmbH. M-Base Engineering + Software GmbH assumes no liability for the system to be free of errors. Any decision about the application of materials must be double checked with the producer of this material.

Additional information about this material, like producer contact address, etc. can be found at www.materialdatacenter.com. For access to this extra information a registration is requested. Free online registration is available.